Investigation of the Influence of Au (Gold) Doping Concentration on the Structural, Morphological, Optical, and Electrical Parameters of an Al/Au:CuO/n-Si Heterojunction Device

dc.authoridAdem/0000-0002-8502-2860
dc.authoridCavusoglu, Halit/0000-0002-7215-651X
dc.authoridHussaini, Ali Akbar/0000-0002-7128-9994
dc.contributor.authorCavusoglu, Halit
dc.contributor.authorHussaini, Ali Akbar
dc.contributor.authorSakalak, Huseyin
dc.contributor.authorKocyigit, Adem
dc.contributor.authorDurmaz, Fatih
dc.contributor.authorYildirim, Murat
dc.date.accessioned2025-05-20T18:59:39Z
dc.date.issued2024
dc.departmentBilecik Şeyh Edebali Üniversitesi
dc.description.abstractIn this investigation, we achieved successful deposition of nanostructured cupric oxide (CuO) thin films onto glass substrates through implementation of successive ionic layer adsorption and reaction (SILAR), all carried out at room temperature. This approach has proven to be highly efficient and yielded favorable results in terms of film quality and uniformity. A comprehensive investigation was conducted to analyze the effect of gold (Au) on the structural, morphological, optical, and electrical properties of nanocrystalline CuO thin films. The structural analysis confirmed that the films were polycrystalline, exhibiting a monoclinic crystal structure with preferential orientations along the (1 over bar 11\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$\overline{1}11$$\end{document}) and (111) planes. The estimated crystallite sizes ranged from 20.37 to 30.77 nm, indicating the nanoscale nature of the films. Scanning electron microscopy/energy-dispersive x-ray analysis (SEM/EDX) was executed to reveal the Au dopant on the surface of CuO thin films. Surface analysis revealed the presence of uniformly dispersed CuO nanostructures across the film surfaces. Through optical investigations, it was observed that the bandgap energy of the CuO thin films decreased from 1.52 to 1.45 eV with increasing Au concentration. Furthermore, the average transmittance of the films exhibited a decrease from 4.9% to 1.3% as the Au concentration increased. The electrical properties of the Al/Au:CuO/n-Si heterojunction were studied using current-voltage (I-V) measurements for various light power densities. The Al/Au:CuO/n-Si heterojunction exhibited good photodiode behavior, with 3.44 A/W responsivity and 1.58 x 1010 Jones specific detectivity for the 2% Au-doped CuO interfacial layer.
dc.description.sponsorshipSelcuk University Scientific Research and Project Council (BAP) [BAP-21401015]
dc.description.sponsorshipThis work was partially supported by the Selcuk University Scientific Research and Project Council (BAP) (Project No. BAP-21401015).
dc.identifier.doi10.1007/s11664-024-10973-6
dc.identifier.endpage2397
dc.identifier.issn0361-5235
dc.identifier.issn1543-186X
dc.identifier.issue5
dc.identifier.scopus2-s2.0-85186255353
dc.identifier.scopusqualityQ2
dc.identifier.startpage2382
dc.identifier.urihttps://doi.org/10.1007/s11664-024-10973-6
dc.identifier.urihttps://hdl.handle.net/11552/8537
dc.identifier.volume53
dc.identifier.wosWOS:001171048700001
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWoS
dc.indekslendigikaynakScopus
dc.indekslendigikaynakWoS - Science Citation Index Expanded
dc.language.isoen
dc.publisherSpringer
dc.relation.ispartofJournal of Electronic Materials
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/openAccess
dc.snmzKA_WOS_20250518
dc.subjectSILAR
dc.subjectCuO thin film
dc.subjectelectrical characteristics
dc.subjectheterojunction
dc.subjectAu
dc.titleInvestigation of the Influence of Au (Gold) Doping Concentration on the Structural, Morphological, Optical, and Electrical Parameters of an Al/Au:CuO/n-Si Heterojunction Device
dc.typeArticle

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