Chemically deposited ZnO thin films at relatively high temperatures

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Natl Inst Optoelectronics

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info:eu-repo/semantics/closedAccess

Özet

In this study, we used chemical bath deposition to produce thin films of zinc oxide. In an attempt to form a novel approach, ZnO films were obtained at relatively high temperatures such as 80-95 degrees C. Accordingly, different from the prior literature studies, the bath temperature was increased to 90 and 95 degrees. The absorbance measurement revealed that the film obtained at 95 degrees C had a relatively low absorbance. Besides, the band gaps of thin films were increased from 3.72 eV to 4.03 eV in response to higher bath temperatures. We used the X-Ray diffraction pattern for analysis and detected that all films were formed in the hexagonal crystal structure. It was understood from the scanning electron microscope images that as the temperature increased, the film became more compact.

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Anahtar Kelimeler

ZnO, Chemical bath deposition, High temperature, Thin films

Kaynak

Journal of Optoelectronics and Advanced Materials

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Cilt

25

Sayı

1-2

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Onay

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