Chemically deposited ZnO thin films at relatively high temperatures

dc.authorid0000-0001-8891-973X
dc.contributor.authorOnal, Metehan
dc.contributor.authorAltiokka, Baris
dc.date.accessioned2025-05-20T19:00:54Z
dc.date.issued2023
dc.departmentBilecik Şeyh Edebali Üniversitesi
dc.description.abstractIn this study, we used chemical bath deposition to produce thin films of zinc oxide. In an attempt to form a novel approach, ZnO films were obtained at relatively high temperatures such as 80-95 degrees C. Accordingly, different from the prior literature studies, the bath temperature was increased to 90 and 95 degrees. The absorbance measurement revealed that the film obtained at 95 degrees C had a relatively low absorbance. Besides, the band gaps of thin films were increased from 3.72 eV to 4.03 eV in response to higher bath temperatures. We used the X-Ray diffraction pattern for analysis and detected that all films were formed in the hexagonal crystal structure. It was understood from the scanning electron microscope images that as the temperature increased, the film became more compact.
dc.identifier.endpage88
dc.identifier.issn1454-4164
dc.identifier.issn1841-7132
dc.identifier.issue1-2
dc.identifier.scopus2-s2.0-85164262767
dc.identifier.scopusqualityQ4
dc.identifier.startpage83
dc.identifier.urihttps://hdl.handle.net/11552/8861
dc.identifier.volume25
dc.identifier.wosWOS:000986509900012
dc.identifier.wosqualityQ4
dc.indekslendigikaynakWoS
dc.indekslendigikaynakScopus
dc.indekslendigikaynakWoS - Science Citation Index Expanded
dc.language.isoen
dc.publisherNatl Inst Optoelectronics
dc.relation.ispartofJournal of Optoelectronics and Advanced Materials
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WOS_20250518
dc.subjectZnO
dc.subjectChemical bath deposition
dc.subjectHigh temperature
dc.subjectThin films
dc.titleChemically deposited ZnO thin films at relatively high temperatures
dc.typeArticle

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